Migration-enhanced epitaxy (MEE) growth of five-layer asymmetric coupled quantum well (FACQW) and its cross-sectional STM observation

Abstract

The five-layer asymmetric coupled quantum well (FACQW) is a new potential-tailored quantum well that is promising for ultra-fast and ultra-low-voltage optical modulators and switches. FACQW samples were grown by the migration-enhanced epitaxy (MEE) and the conventional molecular beam epitaxy methods with steep and flat heterointerfaces in the monolayer accuracy. They were characterized with the cross-sectional scanning tunneling microscopy (STM). In the cross-sectional STM image, double-stripe structures with different contrast were observed. The stripe area corresponds to the FACQW (about 10 nm wide), sandwiched with the AlGaAs barrier layers ( 15 nm wide). A dark line observed at the middle of the FACQW stripe area corresponds to the 3-monolayer-thick AlAs layer. The cross-sectional STM images of the high-quality heterointerface FACQW structures were successfully observed for the samples grown by the MEE method. More detailed studies of this kind of cross-sectional STM observations will be very effective to obtain the optimized growth conditions for fine and complicated ultra-thin structures.