Microwave Performance of Double $\delta$-Doped High Electron Mobility Transistor With Various Lower/Upper Planar-Doped Ratio Designs

Abstract

The microwave noise, power, and linearity characteristics of pseudomorphic high electron mobility transistors (pHEMTs) with various lower/upper planar delta-doped ratios were systematically evaluated and studied. By varying the lower/upper delta-doped ratio from 1:1 to 1:4, both Schottky gate turn-on voltage VON and breakdown voltage VBR were reduced. In addition, higher upper delta-doped design is effective in improving the device current density, transconductance, output power, and power-added efficiency; however, this design also scarified the flatness of transconductance distribution and Schottky performance, resulting in a degradation of device linearity. As to the noise performance, after increasing the upper delta-doped concentration by more than 2 times 1012 cm-2, the minimum noise figure NFmin can be reduced to a stable range, and higher current density cannot efficiently improve the noise performance. Although the 1:4 design provided the largest power density of pHEMT, its high gate leakage current at high input power swing limited its linearity, and 1:3 design achieved the best linearity performance.