Abstract
Atmospheric pressure chemical vapor deposition (APCVD) has preferable properties to the mass production of carbon nanomaterials. Here, we describe a specially-designed microwave-excited atmospheric pressure plasma jet (MW-APPJ) with a 10-mm-wide nozzle based on microstrip line. The MW-APPJ is applied to an APCVD process and nanocrystalline diamond films are successfully deposited on silicon substrates using a mixture gas of Ar/CH4/H2 even in ambient air. The MW-APPJ technology could be suitable for the large-area APCVD system for the synthesis of carbon nanomaterials due to its arrayed configuration for the enlargement of plasma area.
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