Microwave-assisted deposition of uniform thin gold film on glass surface

Abstract

A microwave-assisted method for rapid deposition of continuous gold films on glass substrates has been developed. Under microwave irradiation, gold nanoparticles in colloidal solutions were shown able to assemble on the naked substrates to form a gold monolayer within minutes. Images obtained by AFM revealed that the monolayer formed on the naked glass surface was much the same as that formed on the glass substrates pre-silanized with (3-aminopropyl)-trimethoxysilane. With this monolayer as seeds, further deposition of gold metal on the surface was thus possible and the thickness of the deposited gold was time-dependent as in the case of normal electroless plating. The sum time for preparing a 50-nm gold film on glass was about 15 minutes, much shorter than the existed electroless methods. Electrochemical experiments showed that the prepared gold films were continuous and can be used as stable electrodes able to sustain several hundreds of redox circulation. The quality of the films were also verified by surface plasmon resonance imaging (SPRI) studies and quite sharp pictures of protein dots were obtained, showing a smooth gold surface and proper film thickness were prepared.