Abstract
The shapes and the distribution of TiN within Si3N4-TiN composites prepared by the chemical-vapour deposition of a SiCl4-TiCl4-NH3-H2 system have been examined using an electron microscope. The TiN dispersion in the amorphous Si3N4 matrix was granular and its maximum size was 3 nm. The TiN dispersions inα- andβ-Si3N4 matrices were contained in their respective crystal grains; however, the shape of the TiN dispersions in theα-Si3N4 matrix was markedly different from that in theβ-Si3N4 matrix. Granular TiN dispersions with an average size of 10 nm were observed in theα-Si3N4 matrix. On the other hand, the TiN dispersions in theβ-Si3N4 matrix were columnar with a diameter of several nm having its axis extended to the direction parallel to thec-axis of theβ-Si3N4 crystal.
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