Abstract
The catalytic chemical vapor deposition (cat-CVD), often called “hot-wire CVD”, is a new method of growing polycrystalline silicon (poly-Si) films at low temperatures. The microstructure of such cat-CVD poly-Si films is investigated by high-resolution transmission electron microscopy. The main microstructural features of these poly-Si films are nanometer-diameter columnar crystalline grains surrounded by a very thin amorphous phase. Good electrical properties, such as large carrier mobilities of the films, may be attributed to this microstructure.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
