Abstract
Thin Al-Mg films were prepared by a DC magnetron sputtering on glass substrates covered with photoresist and subsequently free-standing samples were released from the substrate. The surface morphology, grain size and orientations were characterized by atomic force microscopy and transmission electron microscopy equipped with automated orientation and phase mapping software. The grain growth mechanism during sputtering is consistent with sputter deposition oblique incidence theory for growth. Strong preferred (110) orientation in direction perpendicular to the sample surface has been observed in all studied samples.
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