Abstract
TiMoN/Si3N4 nano-multilayer films with different Si3N4 layer thickness were synthesized using magnetron sputtering by changing the Si target current. The TiMoN/Si3N4 nano-multilayer films exhibited strong microstructure and properties dependence on the structures of Si3N4 layer. When Si3N4 layer thickness (lSi3N4) was smaller than 0.8nm, Si3N4 layers maintained crystallization state, the as-deposited TiMoN/SiNx films exhibited much higher hardness and comparable coefficient of friction (COF) than that of MoNx/SiNx films. With the further increase of lSi3N4, Si3N4 layer transformed to amorphous state, the hardness of TiMoN/Si3N4 films decreased gradually from 29.9 to 20.1GPa and COF increased from 0.55 to 0.72. It totally shows better tribological properties than TiAlSiN/Si3N4 nano-multilayer films as a result of incorporating molybdenum nitride.
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