Abstract
Ti–Si–N nanocomposite films were deposited by multitarget reactive magnetron sputtering. Energy dispersive spectroscopy, X-ray diffraction, transmission electron microscopy, and x-ray photoelectron spectroscopy were employed to characterize their microstructure and a microhardness tester was used to measure their hardness. The influence of substrate temperature on these films was investigated, too. The results reveal that the films consist of TiN and Si3N4. Si3N4 exists as amorphous, which strongly prevents the growth of TiN grains and causes TiN to form a nanocrystalline or amorphous phase. The hardness of films deposited at room temperature reaches the peak value of 36 GPa at a Si content of 4.14 at. %, and then decreases gradually with the increase of Si content. The enhancement of the substrate temperature weakens the restraint effect of amorphous Si3N4 on the growth of TiN grains, which results in coarse TiN grains and subsequently leads to a lower peak value and a slower decrease of the hardness of the films.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
