Abstract
TiO2 and Ni-doped TiO2 thin films were prepared by DC magnetron sputtering. The effects of Ni-doping on the microstructure and properties were studied by atomic force microscopy (AFM), X-ray diffraction (XRD), UV-Vis spectra and photocatalysis tesing, respectively. The results show that TiO2 thin films were successfully prepared with smooth surface. When doped with Ni, the surface of TiO2 thin film was improved and the growth of anatase phase was also promoted. With increasing the sputtering power of Ni, the absorption edge wavelegth red shifted and the photocatalysis property of TiO2 thin films was increased and then decreased
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