Abstract
We present the study of the biocompatibility and surface properties of titanium dioxide (TiO2) thin films deposited by direct current magnetron sputtering. These films are deposited on a quartz substrate at room temperature and annealed with different temperatures (100, 300, 500, 800 and 1100 °C). The biocompatibility of the TiO2 thin films is analyzed using primary cultures of dorsal root ganglion (DRG) of Wistar rats, whose neurons are incubated on the TiO2 thin films and on a control substrate during 18 to 24 h. These neurons are activated by electrical stimuli and its ionic currents and action potential activity recorded. Through X-ray diffraction (XRD), the surface of TiO2 thin films showed a good quality, homogeneity and roughness. The XRD results showed the anatase to rutile phase transition in TiO2 thin films at temperatures between 500 and 1100 °C. This phase had a grain size from 15 to 38 nm, which allowed a suitable structural and crystal phase stability of the TiO2 thin films for low and high temperature. The biocompatibility experiments of these films indicated that they were appropriated for culture of living neurons which displayed normal electrical behavior.
Highlights
Recent advances in the complementary metal oxide semiconductor (CMOS) and micro-electro-mechanical systems (MEMS) technologies have allowed the fabrication of CMOS-MEMS devices that can be used on diverse areas such as agriculture, communications, environment, medicine and biomedical applications [1,2,3,4,5]
The inward current density is significantly less for dorsal root ganglion (DRG) neurons grown on the TiO2 thin film surfaces prepared at room temperature and at 300 and 1100 °C than that for DRG neurons grown on the control substrate (Table 2 and Figure 3A)
TiO2 thin films deposited by magnetron sputtering at room temperature and annealed with different temperatures (100, 300, 500, 800 and 1100 °C) were studied, analyzing their morphology and biocompatibility
Summary
Recent advances in the complementary metal oxide semiconductor (CMOS) and micro-electro-mechanical systems (MEMS) technologies have allowed the fabrication of CMOS-MEMS devices that can be used on diverse areas such as agriculture, communications, environment, medicine and biomedical applications [1,2,3,4,5]. The direct current (DC) reactive magnetron sputtering method is used to control the composition and structure of TiO2 films, and it provides a strong substrate adhesion and large area with uniform thickness. This method can adjust the deposition conditions and offers a high deposition rate using argon gas, which is attractive for large-scale production. TiO2 thin films in the biomedical microsensors fabrication, these films must satisfy the in vitro biocompatibility tests These microsensors must be satisfactory evaluated in vivo animals. We present a biocompatibility analysis and surface characterization of TiO2 thin films deposited on a quartz substrate, which are generated by reactive DC magnetron sputtering and annealing at different temperatures
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