Abstract
To research the influence of oxygen flow rate on the structural and optical properties of TiO 2 thin film, TiO 2 films on glass were deposited by reactive magnetron sputtering. The microstructure and optical properties were measured by X-ray diffractometry, AFM and UV-VIS transmittance spectroscopy, respectively. The results show that the films deposited at oxygen flow rate of 10 mL/min has the lowest roughness and the highest transmittance. The absorption angle shifts to longer wavelengths as oxygen flow rates increase from 5 to 10 mL/min, then to shorter ones as the oxygen flow rate increase from 10 to 30 mL/min. The band gap is 3.38 eV, which is nearly constant in the experiment. For the TiO 2 thin films deposited at 10 mL/min of oxyge flow rate, there are nano-crystalline structures, which are suitable for anti-reflection (AR) coating in the solar cells structure system.
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