Abstract
Zirconia films on Si(100) substrate produced by the dual ion beam technique with oxygen ion bombardment and Ar + ion sputtering of Zr were characterized using XRD, RBS and XPS. The results of XRD show that with increasing oxygen ion beam current densities the amorphous microstructure was transformed to a crystalline microstructure: a tetragonal phase together with monoclinic and cubic phases was found. The RBS analyses show that the deposited films consist of three layers: (1) the top layer contaminated by carbon; (2) the bulk of the films with an approximately constant value of the atomic ratio Zr/O; and (3) the transition layer between the bulk of the deposited film and the substrate. Together with XPS the RBS analyses that with the increase of oxygen ion beam current ZrO x with x from 1 3 to 2 was formed.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
