Abstract
The deposition site selectivity of Tl 2O 3 on CdSe surfaces with well defined crystallographic orientations has been investigated. It was found that under illumination anodic deposition of Tl 2O 3 and its cathodic dissolution on a polycrystalline and a single crystal electrode took place reversibly in a Tl + ion containing solution. This deposition reaction was promoted by photogenerated holes and occurred uniformly on the grain surface except on the (0002) face. In the dark, the deposition of Tl 2O 3 only occurred on the polycrystalline electrodes, and no deposition occurred on single crystal electrodes. SEM observation showed that the deposition reaction took place selectively at the grain boundaries and Tl 2O 3 deposited on the grain boundaries did not cathodically redissolve.
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