Abstract
Live electrooptic imaging (LEI) in the microscopic range has been successfully demonstrated for the first time. The finest resolution achieved in the present study is 2.7 μm, which is finer than the previous record by more than an order of magnitude. This drastic improvement in the resolution record has been achieved through comprehensive improvement of the limiting factors of the conventional LEI system. Residual limiting factors in the improved system have been systematically analyzed and ideas for even finer resolution have also been presented.
Highlights
Difference (i) is most likely caused by the dependence of refraction behaviors of the electric force lines on the ZnTe layer thickness (Fig. 5(b)), which could cause the resolution difference
Besides the deviated resolution values, two notable image differences exist between Fig. 4(d and e): (i) the image areas of the negative electric field regions and (ii) the electric field amplitudes just above the line electrodes
The regions of negative electric fields indicated by yellow arrows in the magnitude image in Fig. 4(d) are faint in Fig. 4(e), and the peak amplitudes shown by red arrows in Fig. 5(a) are smaller in Fig. 4(d) than for Fig. 4(e)
Summary
Difference (i) is most likely caused by the dependence of refraction behaviors of the electric force lines on the ZnTe layer thickness (Fig. 5(b)), which could cause the resolution difference. An inclining electric force line originating from the electrode goes upward through the 1.5 μm ZnTe layer with a small crank caused by double refractions, turns downward over the ZnTe layer, and comes back through the ZnTe layer as a negative electric field toward the grounded n-type Si substrate. In the 10 μm ZnTe layer (Fig. 4(e)), this turnaround behavior is much less pronounced due to the possible absence of the double refraction. The EO signals of the downward fields in the lower part of the ZnTe layer could be partly canceled by those of upward electric fields in its upper part due to their fringe geometr
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