Abstract
Conductive filaments formed in Pt/NiO/Pt resistive switching (RS) cells were characterized by conductive atomic force microscopy (C-AFM) and cross-sectional transmission electron microscopy (XTEM) after the removal of top electrodes. The area and current of the filaments were directly detected by C-AFM. By examining various RS cells with different cell resistances in the low-resistance state (RLRS), it has been revealed that the RLRS variation in the range of 10–220 Ω is mainly caused by the variations in the area and shape of the filaments. XTEM was carried out on a filament that dominantly determines RLRS. The area of the filament significantly varied along the thickness direction of a NiO film, which was consistent with the speculation from C-AFM analysis. Furthermore, the filaments observed in this study consist of reduced NiO with an inclusion of platinum, the electrode material, owing to Joule heating by the current during forming.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
