Abstract
The first results of experiments on direct photo-etching of organic polymers using a 10 Hz X-ray source based on a laser-irradiated gas puff target are presented. X-ray radiation in the wavelength range from 2 to 15 nm was produced as a result of irradiation of a double-stream gas puff target with Nd:YAG laser pulses of energy 0.8 J and time duration 3 ns. The resulting X-ray pulses with energy of about 100–200 mJ were used to irradiate samples of organic polymers to create microstructures by direct photo-etching. The obtained results show that direct photo-etching using the laser-plasma X-ray source could be useful for micromachining of organic polymers.
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