Micromachining of organic polymers by direct photo-etching using a laser plasma X-ray source

Abstract

The first experiments on direct photo-etching of organic polymers using a laser plasma X-ray source based on a laser-irradiated gas puff target are presented. High-intensity nanosecond pulses of soft X-ray radiation in the wavelength range from about 1 to 8 nm were produced by irradiation of the xenon/helium double-stream gas puff target with laser pulses from The Prague Asterix Laser System (PALS). The resulting X-ray pulses were used to irradiate samples from organic polymers and form microstructures by X-ray direct photo-etching. The results show relatively high efficiency of X-ray direct photo-etching that could be useful for micromachining of organic polymers.