Abstract
Graphene grown by chemical vapor deposition on 4H-SiC (0001) was studied using micro-Raman spectroscopy and atomic force microscopy (AFM). AFM revealed that the graphene structure grown on on-axis substrates has a stepped morphology. This is due to step bunching, which results from etching in hydrogen as well as from the process of graphene formation itself. It was shown by micro-Raman spectroscopy that the properties of graphene present on step edges and on terraces are quite different. Graphene on terraces is uniform with a relatively small thickness and strain fluctuations. On the other hand, graphene on step edges has a large thickness and strain variations occur. A careful analysis of micro-Raman spatial maps led us to the conclusion that the carrier concentration on step edge regions is lowered when compared with terrace regions.
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