Abstract
The rapid evolution of Industrial Computed Tomography (CT) continues to raise the bar for high-resolution, accurate, and precise imaging tools. Developing effective micro CT test patterns is key to meeting these expectations. This study presents XRnanotech's advanced MicroCT test target, engineered using micro- and nano-fabrication technologies, including electron beam lithography. There are several variants; one set features various lines and spaces with dimensions as small as 200 nm and a gold contrast height of 1.5 µm for high contrast. Another set features a contrast height of approximately 4 µm, with the smallest feature sizes of 300 nm and 400 nm, respectively. The paper highlights its performance metrics, ultimately demonstrating how this innovation advances the potential of MicroCT testing.
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