Abstract
A simple and effective method is reported for the deposition of protective coatings of titanium carbide using low-temperature (as low as 150 °C) metal–organic chemical vapor deposition. This method is based on the thermolysis of metal–organic molecules containing titanium and does not require the high temperature (<1100 °C) involved in the standard TiC–CVD technique. Furthermore, the structure of the films produced (crystalline or amorphous) and their purity (inclusion of organic clusters or hydrogen) can be tailored easily by simple variations in the deposition parameters. This technique permits the coating of polymers and low-melting metals that are thermally too fragile for other deposition techniques. The process could be applied to produce films of other materials, e.g., niobium carbide, silicon carbide, titanium diboride, and gallium arsenide.
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