Abstract
Hydrogen effusion from hydrogenated amorphous silicon (a-Si:H) films, induced by various metal layers (Al, Ni, Cu, Ge, Cr, Au, Ag, Fe, and Sn), has been studied by temperature programed desorption spectroscopy. Significant reduction of the effusion temperature is observed in the presence of Cr, Ni, or Al on the a-Si:H film. Al has the strongest catalytic effect on hydrogen effusion from a-Si:H; H2 effusion is intensive, even at a temperature of 150°C, when the Al layer thickness is larger than 40nm. The strong catalytic effect of Al is considered to be related to the large diffusion constant of Al in a-Si:H.
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