Metal Grating Patterning on Fiber Facets by UV-Based Nano Imprint and Transfer Lithography Using Optical Alignment

Abstract

<para xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> UV-based nano imprint and transfer lithography (NITL) is proposed as a flexible, low cost and versatile approach for defining sub-micron metal patterns on optical fiber facets in a single-processing step. NITL relies on a specially prepared mold carrying the pattern that is to be transferred to the facet. The fiber's light-guiding properties allow control of the position of the metal structures by optical alignment. </para>