Abstract
One-step and two-step metal-assisted electroless chemical etchings of p-type silicon substrate in new solutions were investigated. In the one-step etching process, the etching is performed in NH4HF2/AgNO3 solution. On the other hand, the two-step etching process involves chemical deposition of noble metal onto silicon substrate surface followed by electroless etching in NH4HF2/H2O2 solution. The effect of several parameters on the morphology of etched layer was studied namely: pH of etching solution for the two cases and the etching temperature, the concentration of NH4HF2 and the type of metal deposited on silicon surface for second case. It is shown that the morphology depends strongly on etching parameters where different nanostructure shapes can be formed. An important result is that silicon nanowires are formed at pH=4 and pH≤2 for the first and second case, respectively.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
