Abstract
We have developed a novel technique which utilizes the intensity-dependent dispersion relation of surface plasmons to study the third order nonlinear susceptibility coefficient χ(3). This new technique yields information about both the magnitude and the sign (with respect to χ(1)) of χ(3). Experimental results are reported for GaAs and Si at input wavelengths of 1.05 and 1.11 μm, respectively.
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