Measurement of Thin Oxide Surface Film Thicknesses and Atomic Densities by the Analysis of Positive Ion Excited Soft X-Ray Spectral

Abstract

AbstractCharacteristic soft x-ray emission lines created as a result of low energy (10-100keV) positive ion excitation of a target material has been applied to the study of thin films of oxygen that form naturally on metal surfaces. The specific metals investigated were aluminum and nickel aa well as a number of their corresponding alloys.Low energy positive ions are well suited as projectiles for the study of thin films in that they have low penetrating powers, yet produce high x-ray yields for K-, L-, and M-shell elemental x-ray lines. Perhaps the most important feature is the fact that no background bremsstrahlung continuum x-radiation is generated in the slowing processes of the ions. Exploiting the advantages of these facts, a special high sensitivity detection technique has been developed for the soft x-ray analysis of the constituents that make up a particular thin surface film.The physical basis for thickness and atomic density measurements of thin surface films by positive ion excitation are discussed. Calibration data are presented for thin films of known thickness and composition establishing the sensitivity of the method for the measurement of the elemental atomic densities of thin films down to a few monolayers or approximately 10 Å in thickness. Finally, the results of the analysis of oxide surface films of aluminum, nickel and some of their alloys are presented and discussed.The objective of this continuing program is to gain an understanding of the mechanisms and principles governing the formation of oxide surface films on metals with the basic goal of producing new alloying techniques for metal passification in a saline environment.