Abstract
A modified biased activated reactive evaporation ion plating process was carried out using a magnetic field, in order to enhance ionization efficiency. The magnetic field applied to the plasma has an influence on the kinetic energy of ions as well as on the ionization efficiency. The ionization efficiency almost doubles (from 7.8% to 14.7%) by the applied magnetic field. The kinetic energy analysis of the mass filtered ion was performed in order to gain a better understanding of the ionic behavior in the plasma. The kinetic energy of Ar and N 2 ions increases with the applied magnetic field and electric potential difference between anodic probe and thermionic emitter.
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