Materials characterization using ion, electron, and photon probes

Abstract

The content of a lecture at the senior-graduate level on materials characterization using ion, electron, and ion probes is amplified and extensively referenced. The emphasis of the report is compositional surface analysis using secondary ion mass spectrometry (SIMS), ion scattering spectrometry (ISS), Rutherford backscattering spectrometry (RBS), x-ray photoelectron spectroscopy (XPS), and Auger electron spectroscopy (AES). The physical principles, experimental methods, advantages and limitations, and illustrative examples for each of the five methods are discussed. Composition in depth profiling using sputter ion etching is also described, including mechanisms, yields, rates, instrumentation, advantages, and limitations. Brief comments and literature citations are given for materials characterization using SIMS, ISS, RBS, AES, and XPS in corrosion, surface modification, surface segregration, thin films, and grain boundaries for various materials of interest in industrial materials science and engineering. Extensive references are provided as a guide for those desiring greater depth in the topical areas discussed.