Abstract
The Ion Beam Modification and Analysis Laboratory (IBMAL) at the University of North Texas has set up a dedicated Trace-Element Accelerator Mass Spectrometry (TEAMS) system for low-level impurity measurements. TEAMS has previously shown the ability to measure impurity copper levels in silicon wafers with a better sensitivity than Secondary Ion Mass Spectrometry (SIMS), one of the most sensitive measurement techniques. TEAMS is especially suited for bulk measurements of low levels of impurities in materials. A discussion of some of the issues involved in TEAMS measurements is presented along with the results of impurity iron measurements in silicon.
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