Abstract
This paper provides the mutual low–temperature mass transfer in binary systems obtained by magnetron sputtering of niobium onto a heated copper substrate. Based on the kinetic equation of diffusion, the distribution of the niobium through the substrate’s depth at temperatures of 100, 200 and 300 °C is calculated. The method of calculating the concentration profiles of niobium, proposed in the manuscript, was verified using experimental data of energy–dispersive analysis.
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