Abstract
Calibrating on a series of thicknesses of a single element we arrive at a simple method of mass thickness determination for amorphous and polycrystalline films in the transmission electron microscopy (TEM). The conditions to be fulfilled are: acceleration voltage 200 kV or higher and measuring the integrated transmitted electron intensity in a wide range of angles that contains also the Bragg reflections. Under these conditions the electron scattering depends on Z 2 as predicted by the Rutherford approximation. There is no need to carry out a calibration for atomic number dependence. For multicomponent films of unknown composition the combination of electron and X-ray intensity measurement results in absolute (non-normalized) concentrations and the value of local mass thickness. Examples of quantitative analysis are presented and an extension to single crystal films is discussed.
Published Version
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