Maskless all-UHV process for III-V compound semiconductors

Abstract

Abstract A concept of all-UHV (ultra-high vacuum) resistless process for III-V compound semiconductors is described. This new technology is based on focused ion beam (FIB) doping and molecular beam epitaxy (MBE) in a clean-UHV environment. The submicron-diameter focused ion beams (FIBs) of multiple ion species, which are emitted from a field emission liquid metal ion source (LMIS) are powerful tools for maskless etching, doping, and deposition. Recent developments in FIB processes for III-V compound semiconductors are described, including multicomponent liquid metal ion sources, a focused ion beam implanter, and the physical characteristics of implanted GaAs. Second, preliminary tests of a new compound crystal growth system consisting of MBE layer growth linked with the maskless FIB doping are described. This new technique has been actually used to fabricate planar structures suitable for electrical and optical device integration. Third, innovative UHV processes using electron and photon beams are describ...