Abstract
Variation in film thickness is a common problem with laser deposited thin films. The variation is attributed to the Cosn(0) (n>9) distribution within the laser plume. The value of n is a function of the deposition parameters used. To determine the relationship between parameters, such as target-substrate distance, and the shape of the plasma plume we have developed a non-destructive optical technique for mapping the thickness variation of YBCO thin films. Combining ellipsometric data with spatially resolved optical densities it is possible to profile the thickness of YBCO films to a lateral resolution of 1 micron. Results indicate that the value of n could be as high as 38 under the typical deposition conditions of 5 cm target-substrate distance, 120 mtorr of oxygen and laser fluences of 1.2J/cm2.
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