Abstract
A unique magnetron sputtering cathode with a pinhole-centered permanent magnet has been developed for an inward enlargement of doughnut-shaped plasma discharge. Both a pinhole-centered permanent magnet and a tilt of magnetization vector to the normal to the top surface of the target play an important role for the inward enlargement of the plasma discharge area. The radial differentiated radial component of magnetic field strength, d|Br|/dr, near the center is useful to explain the inward enlargement of the plasma discharge area. By the means of the tilt of magnetic field lines at 45° to the normal to the target surface, the magnetic field lines are compressed near the target center compared with conventional magnetron cathodes, and which also provides strong magnetic mirror configuration near the target center. The target utilization efficiency by volume ratio was ~50 % in the use of proposed magnetron cathode. An aluminum deposition rate of ~6.7 nm/min was obtained under experimental conditions with a target-substrate distance of 150 mm, Ar gas pressure of 0.2 Pa, and DC input power of 100 W.
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