Abstract
This work presents the surface modification of commercially pure Ti specimens (c.p.-Ti) prepared by conventional powder metallurgy by depositing a thin film of a ß-Ti alloy (Ti-35Nb-7Zr-5Ta, wt. %, TNZT). Two types of pulsed technologies: conventional (p-DC) and high-power impulse magnetron sputtering (HiPIMS), with and without bias assistance (−60 V) under similar power conditions (250 W) were applied on titanium specimens and silicon substrates leading to different film morphologies and functional properties. Microstructural, X-ray diffraction, nanoindentation, surface wetting, XPS and electrochemical impedance measurements were done to characterize their functionality. All the coatings presented a reduced Young’s Modulus (E ≤ 80GPa) compared to the bulk Ti, representing a reduction of more than 30 %. This decrease can significantly contribute to the reduction of the stress-shielding effect, mitigating the risk of implant loosening and failure. The hardness values of TNZT coatings, slightly lower than c.p.-Ti substrate, range from 4.1 to 4.7 GPa. XPS analysis shows a passivation layer of TiO2, Nb2O5, and ZrO2, which offers high impedance and excellent corrosion resistance. The best compromise between mechanical and corrosion properties is achieved with the HiPIMS technology, thanks to its compact film microstructure with high electrical resistance, despite its limited thickness of about 1 μm.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
