Abstract
The influence of In surfactant on the giant magnetoresistance (GMR) effect and magnetization processes has been investigated in Co/Cu thermally evaporated multilayers (MLs) with sublayer thicknesses of Co and Cu corresponding to the second antiferromagnetic maximum of interlayer coupling. Based on the X-ray reflectivity (XRR) and atomic force microscopy (AFM) measurements it has been shown that In added in small amount at MLs interface leads to well ordered structures with small roughness (a few A). This fact was reflected in magnetoresistivity values that were also larger for samples with In in comparison to pure Co/Cu multilayers. However, the magnetization hysteresis loops demonstrated the very small fraction of antiferromagnetic coupling in the investigated samples. These results indicate that the role of chemical roughness is not equivalent to the role of magnetic roughness. (© 2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)
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