Abstract
The prominent magnetoelectric (ME) effect in ME composites usually originates from an interfacial strain-mediated coupling between ferroelectric and ferromagnetic components. While ME composite bilayer thin films have been proposed for microdevice applications, the ME coupling is usually diminished because of the substrate clamping effect. Here, we apply simple CMOS/MEMS compatible top-down fabrication techniques to ferroelectric BaTiO3 (BTO) and ferromagnetic CoFe2O4 (CFO) bilayer epitaxial thin films to control the substrate clamping. We found augmented ME coupling in micro-patterned bilayer thin films compared to the as-deposited films due to the reduced substrate clamping. In addition, a site-dependent ME coupling within the microstructure was observed. Larger ME coupling was obtained near the edge of the microstructure, and site-dependent ferroelectric imprints were observed on the micropattern. This can be attributed to the non-uniform substrate clamping across the film, and the strain gradient developed in the BTO layer due to the magnetostriction of CFO. Our findings provide additional insights to the design of micro- and nanoscale devices based on 2–2 ME composite thin films.
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