Abstract
The magnetic thin film inductor with a 4-turn, 337/spl times/337 /spl mu/m/sup 2/ size spiral coil showed inductance 21% larger than the air core's while its quality factor was lower than the air core's. Keeping the similar quality factor as the air core, the micro patterned magnetic film inductor showed 11% inductance enhancement. The proposed inductor can be made on the passivation of integrated semiconductor devices.
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