Abstract
Ge1−xMnx thin films with an average Mn concentration of 0.64 at. % were fabricated through Mn ion implantation into crystalline germanium-on-insulator wafers. Implantation damage was removed and crystallinity restored by pulsed laser melting from a single 30-ns 308-nm XeCl+ excimer laser pulse. Resolidified films demonstrated higher Curie temperatures but smaller saturation magnetizations than those of both as-implanted films and implanted films subjected to rapid thermal annealing. These findings are attributed to the redistribution of Mn during solidification.
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