Abstract
Using novel fabrication methods based on double-templated electrodeposition (DTE), we have grown and characterised highly regular arrays of submicron magnetic dots. Varying the template length scales and the parameters of electrodeposition has allowed us to investigate arrays with periods ranging from 100 to 700 nm, of magnetic dots with diameters that can be set from 20 nm (i.e. well-isolated) to half the array period (i.e. connected dots). The magnetisation curves of these arrays reveal a different behaviour, depending on array parameters.
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