Abstract

The magnetic characteristics of TbFeCoV films deposited at different sputtering conditions were investigated using magnetic force microscope, vibrating sample magnetometer and other testing equipments. A minimum out-of-plane saturation magnetization and a maximum out-of-plane coercivity were obtained for the Tb x (FeCoV)100−x films near the point of compensation x = 23. As x = 23–45, perpendicular magnetization component could be observed, while the second largest saturation magnetization and a relatively low coercivity were obtained in the x = 40 sample. For the amorphous Tb40(FeCoV)60 films, with the increase of sputtering pressure or power, the out-of-plane saturation magnetization increases to a maximum and then decreases while the out-of-plane coercivity shows a monotonously decreasing trend as sputtering power is increased from 43 to 64 W. The change of perpendicular magnetic anisotropy can be confirmed by the difference of magnetic domain for the samples deposited at different sputtering pressures or powers.

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