Abstract
This paper describes a linear magnetic bearing stage which controls a suspended object in six degrees of freedom. The intended application is for X-Y wafer positioning in photolithography stages. Magnetic bearings offer superior performance and resolution over existing mechanical X-Y stages. An advanced prototype magnetic bearing stage that improves the ideas verified in the existing stage has been designed and is currently under construction. The paper will also present the advanced stage design methodology used and the reasons for the decisions made.
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