Macroscopic plasma-chemical approach to plasma polymerization of HMDSO and CH4

Abstract

A thorough investigation of pure HMDSO and methane RF discharges within symmetric and asymmetric reactors yield a basic process constant for the radical-promoted plasma polymerization process. Using a macroscopic approach by measuring the mass deposition rate and the luminosity distribution of the discharges, the well-known reaction parameter power input per monomer flow W/F can be refined by a geometrical factor. Thus, different plasma reactors become comparable and up-scaling is enhanced.