Abstract

The investigation of processing parameters in plasma polymerization is of great interest for the optimization of film properties as well as the comparison and up-scaling of different plasma reactors. For radical-dominated plasma processes, the plasma chemistry in the active plasma zone determines the activation energy E a required to obtain stable, functional coatings. Especially, asymmetrical, radio frequency discharges enable a high conversion of monomer flow into film deposition. However, within one experimental set-up, different activation energies depending on the actual gas flow seemed to appear for pure CH 4 discharges. The differences were found to depend on the different expansion of the plasma into the vacuum chamber, i.e., the width of the active plasma zone d act, which was examined using optical photography. Considering a geometrical scaling factor d act / d gas ( d gas: distance between gas inlet and deposition electrode at a vertical gas flow), a normalized activation energy can be derived determining the plasma polymerization process. The unconfined asymmetrical set-up is compared to a symmetrical reactor with confined geometry supporting the described concept for the up-scaling of plasma processes.

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