Abstract
Thin films of MoO<SUB>3</SUB> were prepared by electron beam evaporation technique. The films were deposited onto glass substrates maintained at temperatures in the range 100 - 250 degrees Celsius. The films were characterized by studying their structure, electrical and optical properties. The films formed at 100 degrees Celsius are amorphous with conductivity of about 2.5 X 10<SUP>-5</SUP> (Omega) <SUP>-1</SUP> cm<SUP>-1</SUP>. The effect of deposition temperature on the properties of the films were studied and discussed.
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