<title>In-situ nanostructure fabrication using finely focused ion beams</title>

Abstract

Nanostructure fabrication for optoelectronic and quantum-effect devices can benefit from the greatly improved surface layer quality and low contamination offered by all vacuum processing. Finely focused ion beams can be used in a variety of ways for vacuum-compatable patterning on a nanometer size scale offering the potential of patterned devices with clean epitaxial interfaces and low dimensional confinement Several of these ion beam patterning techniques will be reviewed.