Abstract
Semitransparent Mo/Si multilayer films with a completely free- standing active area have been developed for use as optical elements in the soft x-ray region. They work not only as a beam splitter, but also as a transmissive polarizer and quarter-wave plate. To achieve a flat, smooth free-standing reflecting surface with a high reflectivity, the following fabrication problems were investigated: stress control of Mo/Si multilayer films, the surface roughness of the initial membrane, and the removal of the initial membrane. A flatness of 1 nm (rms) in the active area was obtained for a fabricated 10-mm-square semitransparent multilayer film. A multilayer film consisting of 50 free-standing pairs of semitransparent Mo/Si were fabricated for transmissive polarizer, and a soft x-ray ellipsometer was developed based on them. The fabricated multilayer polarizer was found to have good polarization performance. Placing two transmissive polarizers in the polarizer/compensator-sample-analyzer configuration enabled full control of the polarization of the probe beam. The modified polarization of light reflected from a sample was analyzed by the rotating-analyzer ellipsometry method. This system was used to measure a multilayer mirror. We verified that the soft X-ray ellipsometer is a very promising tool for the structural evaluation of multilayer films, providing a sensitivity in the sub-angstrom range.
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