Development of Multilayer Optics for EUV, Soft X-Ray and X-Ray Regions in IPOE

Abstract

In EUV and X-ray regions, multilayer mirrors are the essential and necessary optics elements. The good prospects of the EUV and X-ray optics for next generation lithography system, microscopy in the “water windows”, astronomy telescope, spectroscopy, plasma diagnostics, and X-ray laser have impelled the development of multilayer. This report introduced the recent results of the multilayer optics elements in institute of precision optical engineering (IPOE), Tongji University, China, including beam splitters, broad band/angular polarizers, supermirrors, and high-reflectance mirrors. The product of reflectivity and transmittance is above 4% for the Mo/Si multilayer beam splitter at 13.9 nm. Over the 15-17 nm wavelength range, the s-reflectivity of the non-periodic Mo/Si broadband multilayer polarizers is reasonably constant, as high as 36.6%, and the degree of polarization is more than 97.8%. The experimental results of some X-ray supermirrors and high-reflectance mirrors in our lab were also presented.