Abstract
AgInSbTe phase-change films were deposited on K9 glass substrates by RF magnetron sputtering technology using a Ag- In-Sb-Te alloy target. The as-deposited films were annealed at 300 degrees Celsius. The influence of background pressure, sputtering gas pressure and sputtering power on the optical properties of the phase-change films were investigated. It was found that the optical properties of the phase change films were synthetically affected by the sputtering parameters. It is disadvantageous to the optical properties of the films when the sputtering gas pressure and power are too high or too low. Lower background pressure, proper sputtering gas pressure and sputtering power are very important to producing the phase- change films with good properties.© (2001) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
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