Low-temperature reduction of Ge oxide by Si and SiH4 in low-pressure H2 and Ar environment

Abstract

Introduction of Ge into ULSIs has become increasingly attractive because of the higher carrier mobility of Ge. Since Ge native oxide is formed easily in cleanroom air, the control of formation and reduction of the Ge oxide is requested for the introduction of Ge layers into Si process. Here, the reactions between gas phase Ge oxide and Si substrate and between the Ge oxide on Ge epitaxial layer and SiH4 are investigated. The native-oxidized Ge amount is obtained by calculating from chemically shifted peak intensity of Ge 3d measured by X-ray photoelectron spectroscopy. By the adsorption of the Ge oxide on Si(100) surface, pure Ge and Si oxide are formed on the Si surface even at 350°C and the formed Ge amount tends to correspond to the oxidized Si amount, independently of the heat-treatment environment of H2 and Ar under the condition that Si oxide is not reduced by H2. By SiH4 treatment, the amount of the oxidized Ge on the Ge layer decreases drastically even at 350°C and Si oxide is formed on the Ge layer. From these results, it is suggested that the Ge oxide is reduced even at 350°C by Si or SiH4, and the Si oxide and the pure Ge are formed.